Measuring method, measurement apparatus, lithographic apparatus and device manufacturing method

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United States of America Patent

PATENT NO 9891540
SERIAL NO

15504621

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Abstract

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A measurement apparatus including an optical system to provide illumination radiation into a spot on a periodic structure and to receive radiation redirected by the periodic structure, the optical system including a first stop to block zero order radiation from the periodic structure and allow non-zero order radiation to pass, and a second stop to block zero order radiation passing the first stop and to allow the non-zero order radiation to pass, and a radiation detector, downstream of the optical system, to receive the non-zero order radiation.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN
ASML HOLDING N VHOLLAND WEIDE EINDHOVEN VELDHOVEN NORTH BRABANT

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Bijnen, Franciscus Godefridus Casper Veldhoven, NL 47 355
Ebert, Earl William Wilton, US 7 15

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