Process feed management for semiconductor substrate processing

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United States of America Patent

PATENT NO 9892908
SERIAL NO

14660755

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Abstract

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Embodiments related to managing the process feed conditions for a semiconductor process module are provided. In one example, a gas channel plate for a semiconductor process module is provided. The example gas channel plate includes a heat exchange surface including a plurality of heat exchange structures separated from one another by intervening gaps. The example gas channel plate also includes a heat exchange fluid director plate support surface for supporting a heat exchange fluid director plate above the plurality of heat exchange structures so that at least a portion of the plurality of heat exchange structures are spaced from the heat exchange fluid director plate.

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Patent Owner(s)

  • ASM AMERICA, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Dunn, Todd Cave Creek, US 22 7552
Fondurulia, Kyle Phoenix, US 33 7375
Halpin, Mike Scottsdale, US 15 5309
Ibrani, Sokol Scottsdale, US 8 1775
Marquardt, Dave Scottsdale, US 5 1716
Pettinger, Fred Phoenix, US 3 1697
Shero, Eric Phoenix, US 64 17653
White, Carl Gilbert, US 43 8162

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