Substrate treating apparatus and chemical recycling method

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United States of America Patent

PATENT NO 9892939
SERIAL NO

13664844

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Abstract

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Provided is a substrate treating apparatus. The substrate treating apparatus according to embodiments of the present invention may include a cleaning chamber cleaning foreign objects on a substrate, and a recycling unit recycling by recovering a mixed solution including a first chemical and a second chemical used in cleaning of the substrate, wherein the recycling unit includes a separation unit separating the mixed solution recovered from the cleaning chamber, a recovery line connecting the separation unit and the cleaning chamber and allowing the mixed solution to flow into the separation unit, a decompression line having one end connected to the separation unit and exhausting the mixed solution evaporated from the separation unit, and a decompression unit installed in the decompression line and reducing pressure in the separation unit.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTD77 4SANDAN 5-GIL JIKSAN-EUP SEOBUK-GU CHEONAN-SI CHUNGCHEONGNAM-DO 31040

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Dong Soon Asan-si, KR 1 2
Kang, Byung Chul Cheonan-si, KR 7 22
Ryu, Jaeryung Asan-si, KR 1 2

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