Substrate holding/rotating device, substrate processing apparatus including the same, and substrate processing method
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United States of America Patent
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Feb 13, 2018
Issued Date -
N/A
app pub date -
Sep 21, 2016
filing date -
Sep 29, 2015
priority date (Note) -
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Abstract
This substrate holding/rotating device includes an opening magnet forming a predetermined magnetic field generation region through which each movable pin rotating in response to rotation of the rotary table is capable of passing, the magnetic field generation region disposed so as to be eccentric with respect to a rotation direction of the rotary table and so as to allow only driving magnets corresponding to part of the plurality of movable pins to pass through the magnetic field generation region, the opening magnet giving a repulsive force or an attractive force to the driving magnet of the movable pin passing through the magnetic field generation region, the opening magnet generating a force that enables the support portion of the movable pin urged to the hold position by the urging unit to move toward the open position against an urging force of the urging unit.
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