Extreme ultraviolet light generation apparatus

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United States of America Patent

PATENT NO 9894743
SERIAL NO

14984458

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Abstract

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An apparatus for generating extreme ultraviolet light may include: a chamber having an opening through which a laser beam is introduced into the chamber; a reference member on which the chamber is mounted; a target supply unit for supplying a target material to be irradiated by the laser beam to a predetermined region inside the chamber; a laser beam focusing optical system for focusing the laser beam in the predetermined region inside the chamber to turn the target material into plasma; and a collector mirror for collecting the extreme ultraviolet light emitted from the plasma.

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Patent Owner(s)

Patent OwnerAddress
GIGAPHOTON INCTOCHIGI COUNTY JAPAN TOCHIGI

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Igarashi, Miwa Oyama, JP 25 492
Moriya, Masato Oyama, JP 86 1341
Nakarai, Hiroaki Hiratsuka, JP 7 48
Watanabe, Yukio Hiratsuka, JP 145 2111

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