Metal alkoxide compound, thin-film-forming material, method for producing thin film, and alcohol compound

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United States of America Patent

PATENT NO 9896468
SERIAL NO

14413102

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Abstract

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Disclosed is a metal alkoxide compound having physical properties suitable for a material for forming thin films by CVD, and particularly, a metal alkoxide compound having physical properties suitable for a material for forming metallic-copper thin films. A metal alkoxide compound is represented by general formula (I). A thin-film-forming material including the metal alkoxide compound is described as well. (In the formula, R1 represents a methyl group or an ethyl group, R2 represents a hydrogen atom or a methyl group, R3 represents a C1-3 linear or branched alkyl group, M represents a metal atom or a silicon atom, and n represents the valence of the metal atom or silicon atom.

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Patent Owner(s)

Patent OwnerAddress
ADEKA CORPORATIONARAKAWA-KU TOKYO 116-8554

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hatase, Masako Tokyo, JP 25 15
Saito, Akio Tokyo, JP 152 3226
Sakurai, Atsushi Tokyo, JP 209 1709
Shiratori, Tsubasa Tokyo, JP 15 386
Yamada, Naoki Tokyo, JP 428 4961
Yoshino, Tomoharu Tokyo, JP 37 44

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