Method for following degassing rate by measuring partial pressures measured by mass spectrometry

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United States of America Patent

PATENT NO 9903801
SERIAL NO

14473457

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A method for following the degassing of a component placed in a vacuum chamber, comprises: measuring partial pressures Pi for a set M of reference atomic masses, by means of a mass spectrometer connected to the vacuum chamber; determining a degassing rate η, at least as a function of the measured partial pressures Pi; and, calculating a slope of the variation in the degassing rate. The degassing rate η may advantageously be determined by calculation by means of a relationship of the type:

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  • THALES

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Inventor Name Address # of filed Patents Total Citations
Bettacchioli, Alain Roger Dante Cannes la Bocca, FR 1 0

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