Overlay measurement of pitch walk in multiply patterned targets
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United States of America Patent
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Feb 27, 2018
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N/A
app pub date -
Jun 9, 2015
filing date -
Jan 15, 2014
priority date (Note) -
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Abstract
Multiply patterned metrology targets and target design methods are provided to enable pitch walk measurements using overlay measurements. Multiply patterned structures having single features or spacers produced simultaneously and sharing a common pitch with the paired features or spacers are used to express pitch walk as a measurable overlay between the structures. For example, targets are provided which comprise a first multiply patterned structure having a single left-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers, and a second multiply patterned structure having a single right-hand feature or spacer produced simultaneously and sharing a common pitch with the respective paired features or spacers.
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