Reducing an optical power of a reflected light beam

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United States of America Patent

PATENT NO 9904068
SERIAL NO

15402134

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Abstract

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A system for an extreme ultraviolet (EUV) light source includes a light-generation system configured to emit one or more light beams onto a beam path; one or more optical amplifiers, each of the one or more amplifiers including a gain medium on the beam path, each gain medium being configured to amplify the one or more light beams to produce one or more amplified light beams; and one or more diffractive optical elements on the beam path, where each of the one or more diffractive optical elements has a plurality of focal lengths, and each focal length of the diffractive optical element is associated with a particular polarization state.

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Patent Owner(s)

Patent OwnerAddress
ASML NETHERLANDS B V5500 AH VELDHOVEN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Conklin, Philip M San Diego, US 3 2
Stinson, Cory Alan San Diego, US 7 16

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