Method and system for optimizing optical inspection of patterned structures

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United States of America Patent

PATENT NO 9904993
SERIAL NO

15050613

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Abstract

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A system and method are presented for use in inspection of patterned structures. The system comprises: data input utility for receiving first type of data indicative of image data on at least a part of the patterned structure, and data processing and analyzing utility configured and operable for analyzing the image data, and determining a geometrical model for at least one feature of a pattern in said structure, and using said geometrical model for determining an optical model for second type of data indicative of optical measurements on a patterned structure.

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Patent Owner(s)

Patent OwnerAddress
NOVA LTDP O BOX 1630 DAVID FIKES 5 7632805 REHOVOT 7632805

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brill, Boaz Rehovot, IL 62 644

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