Resist composition, method for forming resist pattern, polyphenolic compound for use in the composition, and alcoholic compound that can be derived therefrom

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United States of America Patent

PATENT NO 9908831
SERIAL NO

15000403

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Abstract

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A resist composition containing a compound represented by the general formula (1) or (2), a method for forming a resist pattern using the composition, a polyphenolic compound for use in the composition, and an alcoholic compound that can be derived therefrom are described.

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Patent Owner(s)

  • MITSUBISHI GAS CHEMICAL COMPANY, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Echigo, Masatoshi Hiratsuka, JP 132 598
Yamakawa, Masako Hiratsuka, JP 10 136

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