Composition and method for polishing memory hard disks

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United States of America Patent

PATENT NO 9909032
SERIAL NO

14156201

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Abstract

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The invention provides a chemical-mechanical polishing composition containing aluminate-modified silica particles, a polyacrylamide, a heterocyclic film-forming agent, and water. The invention also provides a method of chemically-mechanically polishing a substrate, especially a nickel-phosphorous substrate, by contacting a substrate with a polishing pad and the chemical-mechanical polishing composition, moving the polishing pad and the polishing composition relative to the substrate, and abrading at least a portion of the substrate to polish the substrate.

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Patent Owner(s)

  • CABOT MICROELECTRONICS CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Palanisamy, Chinnathambi Selvaraj Taman Jurong, SG 11 35
White, Michael Ridgefield, US 211 6333

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