Scanning probe lithography methods utilizing an enclosed sinusoidal pattern

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United States of America Patent

PATENT NO 9911574
SERIAL NO

15235717

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Abstract

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Provided among other things are a scanning electron microscope, scanning transmission electron microscope, focused ion beam microscope, ion beam micromachining device, or scanning probe nanofabrication device, wherein the microscope or device is configured to move a substrate and a scanning modality relative to one another with an enclosed sinusoidal trajectory, and methods of operation.

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Patent Owner(s)

Patent OwnerAddress
THE TRUSTEES OF PRINCETON UNIVERSITY619 ALEXANDER ROAD SUITE 102 PRINCETON NJ 08540

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cai, Wei Princeton, US 71 23
Yao, Nan Princeton, US 11 219

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