Single mask set used for interposer fabrication of multiple products

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United States of America Patent

PATENT NO 9915869
SERIAL NO

14321591

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Abstract

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A method for fabricating an interposer wafer includes providing at least one mask having printing regions for forming a plurality of interposer designs; selecting an interposer design; and forming the interposer design on a substrate using a plurality of lithographic imaging steps. For each lithographic imaging step, at least one portion of the interposer design is printed by exposing at least one of the printing regions while blocking at least one other of the printing regions.

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Patent Owner(s)

  • XILINX, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hisamura, Toshiyuki San Jose, US 4 11

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