Exposure apparatus, exposure method, and device manufacturing method

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United States of America Patent

PATENT NO 9915878
SERIAL NO

15204389

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Importance

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Abstract

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An exposure apparatus transfers a pattern on a wafer by irradiating a reticle with an illumination light, and the pattern is formed on a pattern surface of the reticle. The exposure apparatus is provided with a reticle stage that moves holding the reticle, and a sensor that irradiates a measurement light on the pattern surface of the reticle held by the reticle stage and detects speckles from the pattern.

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Patent Owner(s)

  • NIKON CORPORATION

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Shibazaki, Yuichi Kumagaya, JP 292 4970

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