Substrate and patterning device for use in metrology, metrology method and device manufacturing method
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United States of America Patent
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Mar 13, 2018
Grant Date -
Nov 19, 2015
app pub date -
May 12, 2015
filing date -
May 13, 2014
priority date (Note) -
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Abstract
A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets which are for measuring overlay using X-ray scattering and small targets which are for measuring overlay by diffraction of visible radiation. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas.
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