GHOST ARTIFACT REMOVAL SYSTEM AND METHOD

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United States of America Patent

SERIAL NO

15261819

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Abstract

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A method for removing a ghost artifact from a multiple-exposure image of a scene method includes steps of generating and segmenting a difference mask, determining a lower threshold and an upper threshold, generating a refined mask, and generating a corrected image. The difference mask includes a plurality of absolute differences in luminance-values between the multiple-exposure image and a first image of the scene. The segmenting step involves segmenting the difference mask into a plurality of blocks. The lower and upper thresholds are based on statistical properties of the blocks. The method generates the refined mask by mapping each absolute difference to a respective one of a plurality refined values, of the refined mask, equal to a function of the absolute difference, the lower threshold, and the upper threshold. The corrected image is a weighted sum of the first image and the multiple-exposure image, weights being based on the refined mask.

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Patent Owner(s)

Patent OwnerAddress
OMNIVISION TECHNOLOGIES INC4275 BURTON DRIVE SANTA CLARA CA 95054

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Swami, Sarvesh San Jose, US 10 33
Uvarov, Timofey Milpitas, US 8 27
Wu, Donghui San Mateo, US 121 1288

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