Apparatus and method for minimizing thermal distortion in electrodes used with ion sources

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United States of America Patent

PATENT NO 9916966
SERIAL NO

15415944

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Abstract

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An apparatus for improving the uniformity of an ion beam is disclosed. The apparatus includes a heating element to heat an edge of the suppression electrode that is located furthest from the suppression aperture. In operation, the edge of the suppression electrode nearest to the suppression electrode may be heated by the ion beam. This heat may cause the suppression electrode to distort, affecting the uniformity of the ion beam. By heating the distal edge of the suppression electrode, the thermal distortion of the suppression electrode can be controlled. In other embodiments, the distal edge of the suppression electrode is heated to create a more uniform ion beam. By monitoring the uniformity of the ion beam downstream from the suppression electrode, such as by use of a beam uniformity profiler, a controller can adjust the heat applied to the distal edge to achieve the desired ion beam uniformity.

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Patent Owner(s)

  • VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Buonodono, James P Amesbury, US 13 15

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