Method of forming a structure on a substrate

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United States of America Patent

PATENT NO 9916980
SERIAL NO

15380895

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Abstract

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A method of forming a layer on a substrate is provided by providing the substrate with a hardmask material. The hardmask material is infiltrated with infiltration material during N infiltration cycles by:

    a) providing a first precursor to the hardmask material on the substrate in the reaction chamber for a first period T1;b) removing a portion of the first precursor for a second period T2; and,c) providing a second precursor to the hardmask material on the substrate for a third period T3, allowing the first and second precursor to react with each other forming the infiltration material.

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Patent Owner(s)

  • ASM IP HOLDING B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
De, Roest David Kurt Kessel-L, BE 22 2761
Jongbloed, Bert Oud-Heverlee, BE 53 5243
Kachel, Krzysztof Kamil Heverlee, BE 9 1946
Knaepen, Werner Leuven, BE 43 5521
Maes, Jan Willem Wilrijk, BE 106 15548
Pierreux, Dieter Dilbeek, BE 62 6020

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