METHODS OF FABRICATING AN IMAGE SENSOR

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United States of America Patent

SERIAL NO

15261997

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Abstract

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A method of fabricating an image sensor includes the following steps. A substrate is provided. A first infrared filter is formed on a first region of the substrate. A second infrared filter is deposited on the substrate and the first infrared filter. The deposited second infrared filter covers the first infrared filter. The second infrared filter is lowered to expose the first infrared filter. The lowered second infrared filter is on a second region of the substrate and neighbors the first infrared filter.

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Patent Owner(s)

Patent OwnerAddress
HIMAX TECHNOLOGIES LIMITEDTAINAN CITY 74148

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
CHEN, Po-Nan Tainan City, TW 18 14
HSIEH, Yu-Jui Tainan City, TW 22 16
YANG, Ya-Jing Tainan City, TW 9 11

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