Semiconductor device comprising planar gate and trench field electrode structure

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United States of America Patent

PATENT NO 9917159
SERIAL NO

14672364

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Abstract

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An embodiment of a semiconductor device includes a transistor cell array having transistor cells in a semiconductor body. A planar gate structure is on the semiconductor body at a first side. Field electrode trenches extend into the semiconductor body from the first side. Each of the field electrode trenches includes a field electrode structure. A depth d of the field electrode trenches is greater than a maximum lateral dimension wmax of the field electrode trenches at the first side.

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Patent Owner(s)

Patent OwnerAddress
INFINEON TECHNOLOGIES AUSTRIA AGSIEMENSSTRASSE 2 VILLACH 9500

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirler, Franz Isen, DE 402 3614
Hutzler, Michael Villach, AT 32 83
Siemieniec, Ralf Villach, AT 120 603

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