Graphene etching methods, systems, and composites

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United States of America Patent

PATENT NO 9919929
SERIAL NO

15100616

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Abstract

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Techniques described herein generally relate to etching graphene. The techniques can include disposing graphene on a patterned substrate, applying a resist to the graphene on the patterned substrate, curing the resist, and etching exposed portions of the graphene. Graphene composites including patterned substrates, graphene disposed on the patterned substrate, and a resist disposed on the graphene, are disclosed. Systems configured to perform the methods and/or make the graphene composites are also disclosed.

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Patent Owner(s)

Patent OwnerAddress
EMPIRE TECHNOLOGY DEVELOPMENT LLCWILMINGTON DE

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Anderson, Kraig Burlingame, US 28 384
Sjong, Angele Louisville, US 52 37

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