Polishing agent for synthetic quartz glass substrate

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United States of America Patent

PATENT NO 9919962
SERIAL NO

14511065

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Abstract

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Disclosed is a polishing agent for synthetic quartz glass substrates, which is characterized by containing a colloidal solution of a colloidal silica or the like having a colloid concentration of 20-50% by mass, and a polycarboxylic acid polymer, an acidic amino acid, a phenol or a glycosaminoglycan.

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Patent Owner(s)

  • SHIN-ETSU CHEMICAL CO., LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Harada, Daijitsu Joetsu, JP 43 67
Shibano, Yukio Joetsu, JP 16 113
Takeuchi, Masaki Joetsu, JP 166 1188
Ueda, Shuhei Joetsu, JP 24 189
Watabe, Atsushi Joetsu, JP 20 66

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