Method of cleaning thin film forming apparatus, thin film forming method, thin film forming apparatus and non-transitory recording medium
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United States of America Patent
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Mar 20, 2018
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N/A
app pub date -
Dec 23, 2013
filing date -
Dec 27, 2012
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Abstract
A method of cleaning a thin film forming apparatus wherein a process for supplying a film forming gas into a reaction tube of the thin film forming apparatus to form a thin film on an object to be processed is repeated more than one time and then a cleaning gas is supplied into the reaction tube to remove extraneous particles attached to an interior of the apparatus, the method comprising: a first cleaning process including supplying a first cleaning gas into the reaction tube to remove the extraneous particles attached to the interior of the apparatus when a first cleaning start conditions is satisfied; and a second cleaning process including performing a cleaning process that is different from the first cleaning process when a second cleaning start condition that is different from the first cleaning start condition is satisfied.
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