Plasma processing method

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United States of America Patent

PATENT NO 9922841
SERIAL NO

14959049

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Abstract

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A plasma processing method uses a plasma processing apparatus including a processing chamber, a mounting table provided in the processing chamber and configured to support a target object, and a ceiling member made of silicon and provided above the mounting table. The plasma processing method includes loading the target object into the processing chamber and generating a plasma of a processing gas containing chlorine gas and oxygen gas in the processing chamber.

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Patent Owner(s)

  • TOKYO ELECTRON LIMITED

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kanamori, Haruto Miyagi, JP 1 2
Niitsuma, Ryosuke Miyagi, JP 10 395

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