Process for making and using a semiconductor wafer containing first and second DOEs of standard cell compatible, NCEM-enabled fill cells, with the first DOE including side-to-side short configured fill cells, and the second DOE including chamfer short configured fill cells

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United States of America Patent

PATENT NO 9922968
SERIAL NO

15475198

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Abstract

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A process for making and using a semiconductor wafer includes instantiating first and second designs of experiments (DOEs), each comprised of at least two fill cells. The fill cells contain structures configured to obtain in-line data via non-contact electrical measurements (“NCEM”). The first DOE contains fill cells configured to enable non-contact (NC) detection of side-to-side shorts, and the second DOE contains fill cells configured to enable NC detection of chamfer shorts. The process may further include obtaining NC measurements from the first and/or second DOE(s) and using such measurements, at least in part, to selectively perform additional processing, metrology or inspection steps on the wafer, and/or on other wafer(s) currently being manufactured.

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PDF SOLUTIONS INC2858 DE LA CRUZ BOULEVARD SANTA CLARA CA 95050

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Brozek, Tomasz Morgan Hill, US 87 297
Cheng, Jeremy San Jose, US 119 311
Ciplickas, Dennis San Jose, US 89 381
Comensoli, Simone Darfo Boario Terme, IT 80 105
De, Indranil Mountain View, US 120 1081
Doong, Kelvin Hsinchu, TW 81 186
Eisenmann, Hans Tutzing, DE 86 154
Fiscus, Timothy New Galilee, US 81 114
Haigh, Jonathan Pittsburgh, US 98 229
Hess, Christopher Belmont, US 125 1363
Kibarian, John Los Altos Hills, US 89 539
Lam, Stephen Freemont, US 127 2094
Lee, Sherry Monte Sereno, US 88 398
Liao, Marci Santa Clara, US 80 105
Lin, Sheng-Che Hsinchu, TW 86 105
Matsuhashi, Hideki Santa Clara, US 84 142
Michaels, Kimon Monte Sereno, US 88 280
O'Sullivan, Conor Campbell, US 93 266
Rauscher, Markus Munich, DE 90 914
Rovner, Vyacheslav Pittsburgh, US 80 105
Strojwas, Andrzej Pittsburgh, US 81 124
Strojwas, Marcin Pittsburgh, US 80 105
Taylor, Carl Pittsburgh, US 90 1069
Vallishayee, Rakesh Dublin, US 83 357
Weiland, Larg Hollister, US 81 105
Yokoyama, Nobuharu Tokyo, JP 80 105

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