Mask blank, method of manufacturing mask blank and method of manufacturing transfer mask
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United States of America Patent
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Mar 27, 2018
Issued Date -
N/A
app pub date -
Aug 1, 2014
filing date -
Aug 28, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
Provided is a mask blank, including: a resist layer formed by a chemically amplified resist; a protective layer formed to coat the resist layer; and a buffer layer provided between the resist layer and the protective layer, wherein the protective layer contains an acidic substance, a basic substance, and a salt generated by a reaction between the acidic substance and the basic substance, and the buffer layer has a portion which is a surface layer portion of a pre-coated resist layer before being coated by the protective layer, and in which the pre-coated resist layer and the protective layer 4 are in contact with each other, and this portion is formed by receiving the acidic substance, the basic substance, and the salt moved from the protective layer 4.
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