Magnetron sputtering target and process for producing the same
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United States of America Patent
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Mar 27, 2018
Issued Date -
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app pub date -
Jun 24, 2014
filing date -
Aug 6, 2010
priority date (Note) -
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Abstract
A process for producing a magnetron sputtering target includes: mixing and dispersing an oxide powder and a magnetic metal powder, the magnetic metal powder containing a ferromagnetic metal element, to obtain a magnetic powder mixture; mixing and dispersing an oxide powder and each of a plurality of non-magnetic metal powders, the plurality of non-magnetic metal powders containing the ferromagnetic metal element, the plurality of non-magnetic metal powders containing a different constituent element from each other or containing constituent elements at different ratios from each other, to obtain a plurality of non-magnetic powder mixtures; and mixing and dispersing the magnetic powder mixture and the plurality of non-magnetic powder mixtures to obtain a powder mixture for pressure sintering.
First Claim
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International Classification(s)
- H01J:ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- C23C:COATING METALLIC MATERIAL; COATING MATERIAL WITH M....
- B22F:WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES F....
- G11B:INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BET....
- H01F:MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF M....
- C22C:ALLOYS
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