Nonparallel island etching

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United States of America Patent

PATENT NO 9938139
SERIAL NO

15033015

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Abstract

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Etching islands are formed on a first face of a substrate and a second face of the substrate non-parallel to the first face. The first face and the second face of the substrate are concurrently exposed to a solution that reacts with the etching islands to concurrently form porous regions extending into the first face and the second face.

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Patent Owner(s)

  • HEWLETT-PACKARD COMPANY

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
McKay, Roger A Corvallis, US 3 0
Sadik, Patrick W Corvallis, US 2 0

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