Method for producing silicon nitride substrate

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United States of America Patent

PATENT NO 9938444
SERIAL NO

15121443

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Abstract

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A method for producing a silicon nitride substrate includes a raw material powder preparation step of preparing a raw material powder containing a silicon powder, a rare earth element compound, and a magnesium compound, wherein, when the amount of silicon in the raw material powder is expressed in terms of a silicon nitride content, the raw material powder contains the rare earth element compound at 1 mol % to 7 mol % in terms of an oxide content and contains the magnesium compound at 8 mol % to 15 mol % in terms of an oxide content; a sheet forming step of forming the raw material powder into a sheet article; a nitriding step of heating the sheet article in a nitrogen atmosphere at 1200° C. to 1500° C. and nitriding silicon contained in the sheet article; and a sintering step of sintering the sheet article under a nitrogen atmosphere after the nitriding step.

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Patent Owner(s)

Patent OwnerAddress
JAPAN FINE CERAMICS CO LTD3-10 AKEDORI IZUMI-KU SENDAI MIYAGI PREF 981-3206

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hirao, Kiyoshi Aichi, JP 15 139
Hyuga, Hideki Aichi, JP 9 23
Kusano, Dai Miyagi, JP 5 6
Tanabe, Gen Miyagi, JP 16 106
Zhou, You Aichi, JP 162 1091

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