Polyvinylacetal resin for heat-developable photosensitive material and heat-developable photosensitive material

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United States of America Patent

PATENT NO 9951154
SERIAL NO

15124103

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Abstract

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A polyvinyl acetal resin for a heat-developable photosensitive material capable of preventing skinning in the coating process of the photosensitive layer of the heat-developable photosensitive material, preventing deterioration of image characteristics and coloration of the coating solution, and suppressing the occurrence of odor at the time of producing the heat-developable photosensitive material and heat development.

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Patent Owner(s)

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SEKISUI CHEMICAL CO LTDOSAKA JAPAN

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Maeda, Takayuki Shiga, JP 22 132
Miyai, Jiro Shiga, JP 13 202
Naruwaki, Shogo Shiga, JP 1 0
Yamauchi, Kenji Shiga, JP 73 458

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