Substrate cleaning method, substrate cleaning system, and memory medium
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United States of America Patent
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Apr 24, 2018
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app pub date -
Nov 12, 2014
filing date -
Nov 13, 2013
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Abstract
A method for cleaning a substrate includes supplying to a substrate a film-forming processing liquid which includes a volatile component and forms a film on the substrate, vaporizing the volatile component in the film-forming processing liquid such that the film-forming processing liquid solidifies or cures on the substrate and forms a processing film on the substrate, supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate, and supplying to the processing film formed on the substrate a dissolving-processing liquid which dissolves the processing film after the supplying of the strip-processing liquid.
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