Substrate treating apparatus
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United States of America Patent
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May 1, 2018
Issued Date -
N/A
app pub date -
Aug 2, 2016
filing date -
Aug 21, 2015
priority date (Note) -
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Abstract
A substrate treating apparatus includes a front heat-treating block, a front relay block and a solution treating block. The front heat-treating block has heat-treating units and main transport mechanisms. The front relay block has receivers and transport mechanisms. The solution treating block has solution treating units and transport mechanisms for solution treatment. The front heat-treating block and front relay block are connected to be able to transport substrates reciprocally. The front relay block and solution treating block are connected to be able to transport the substrates reciprocally. The front relay block is disposed between the solution treating block and front heat-treating block.
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