Ruthenium compound, preparation method therefor, precursor composition for film deposition containing same, and method for depositing film by using same

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United States of America Patent

PATENT NO 9957614
APP PUB NO 20170226638A1
SERIAL NO

15314839

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Abstract

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The present disclosure relates to a novel ruthenium compound, a method for preparing the ruthenium compound, a precursor composition for depositing a ruthenium-containing film including the ruthenium compound, and a method for depositing a ruthenium-containing film by using the precursor composition.

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Patent Owner(s)

Patent OwnerAddress
UP CHEMICAL CO LTD81 SANDAN-RO 197BEON-GIL PYEONGTAEK-SI GYEONGGI-DO PYEONGTAEK-SI 17749

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Han, Won Seok Pyeongtaek-si, KR 44 157
Kim, So Young Pyeongtaek-si, KR 166 757
Koh, Wonyong Daejeon, KR 21 1513

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