Substrate holding and rotating device, substrate processing device equipped with same, and substrate processing method
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United States of America Patent
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May 8, 2018
Issued Date -
N/A
app pub date -
Mar 31, 2014
filing date -
Jun 18, 2013
priority date (Note) -
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status (Latency Note)
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Abstract
A substrate treatment apparatus includes a turntable, a rotative drive unit, a holding pin provided on the turntable, a protection disk for covering a lower surface of a substrate, and a magnetic levitation mechanism that levitates the protection disk from the turntable. The protection disk is vertically movable relative to the turntable between a lower position and an adjacent position above the lower position and close to a lower surface of the substrate. The magnetic levitation mechanism includes a protection disk permanent magnet and an annual guard permanent magnet held by a splash guard. When a guard drive mechanism moves up the splash guard, the protection disk is levitated from the turntable and held at the adjacent position by a magnetic repulsive force generated between the permanent magnets.
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