Distributed, concentric multi-zone plasma source systems, methods and apparatus

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United States of America Patent

PATENT NO 9967965
SERIAL NO

13627696

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Abstract

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A processing chamber including multiple plasma sources in a process chamber top. Each one of the plasma sources is a ring plasma source including a primary winding and multiple ferrites. A plasma processing system is also described. A method of plasma processing is also described.

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Patent Owner(s)

Patent OwnerAddress
LAM RESEARCH CORPORATION4650 CUSHING PKWY FREMONT CALIFORNIA 94538 94538

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Benzerrouk, Souheil Hudson, US 18 929
Cowe, Andrew Andover, US 15 817
Entley, William Wakefield, US 2 2
Gottscho, Richard Fremont, US 16 1073
Nagarkatti, Siddharth P Acton, US 25 2022
Shajii, Ali Weston, US 84 3115

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