Polymer compound, negative resist composition, laminate, patterning process, and compound

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United States of America Patent

PATENT NO 9969829
SERIAL NO

15399220

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Abstract

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The present invention provides a polymer compound containing a repeating unit shown by the following general formula (1). There can be provided a polymer compound usable in a negative resist composition that can achieve high resolution of 50 nm or less and small LER and cause very few defects, a negative resist composition using the polymer compound, and a patterning process using the negative resist composition.

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Patent Owner(s)

Patent OwnerAddress
SHIN-ETSU CHEMICAL CO LTDTOKYO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Domon, Daisuke Jyoetsu, JP 54 432
Hasegawa, Koji Jyoetsu, JP 299 3234
Kotake, Masaaki Jyoetsu, JP 44 87
Masunaga, Keiichi Jyoetsu, JP 92 614

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