Sputtering target for magnetic recording medium, and process for producing same
Number of patents in Portfolio can not be more than 2000
United States of America Patent
Stats
-
May 15, 2018
Issued Date -
N/A
app pub date -
Mar 1, 2013
filing date -
Mar 9, 2012
priority date (Note) -
In Force
status (Latency Note)
Importance
Abstract
A sputtering target for a magnetic recording medium, wherein an average grain area of a B-rich phase is 90 μm2 or less. A process for producing a sputtering target for a magnetic recording medium, wherein an alloy cast ingot is subject to heat treatment, thereafter subject to primary rolling which includes at least one pass of cold rolling, thereafter subject to secondary rolling, and machined to prepare a target. The obtained sputtering target for a magnetic recording medium has few cracks in the B-rich phase and has a high leakage flux density, and by using this target, it is possible to stabilize the discharge during sputtering, suppress arcing which occurs from cracks in the B-rich phase, and suppress the generation of particles.
First Claim
Family
International Classification(s)
Cited Art Landscape
Patent Citation Ranking
Advertisement
Advertisement
Advertisement
Recipient Email Address
Recipient Email Address
Comment
Recipient Email Address
Add to Portfolio(s)
To add this patent to one, or more, of your portfolios, simply click the add button.
This Patent is in these Portfolios:
Add to additional portfolios:
Last Refreshed On:
Changes done successfully