Photosensitive element, photosensitive element roll, method for producing resist pattern, and electronic component

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United States of America Patent

PATENT NO 9971244
APP PUB NO 20160077434A1
SERIAL NO

14786461

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ATTORNEY / AGENT: (SPONSORED)

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Abstract

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A photosensitive element 1 comprises a support film 10, a protective film (polypropylene film) 30, and a photosensitive layer 20 which is arranged between the support film 10 and the protective film 30, wherein the protective film 30 has a principal surface 30a at a side of the photosensitive layer 20 and a principal surface 30b at an opposite side of the principal surface 30a, and the principal surface 30a and the principal surface 30b are smooth.

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Patent Owner(s)

  • HITACHI CHEMICAL COMPANY, LTD.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Abe, Koji Tokyo, JP 324 2465
Kiryu, Manami Tokyo, JP 1 2
Mukai, Ikuo Tokyo, JP 17 77
Sasahara, Naoki Tokyo, JP 14 60
Sato, Mayumi Tokyo, JP 20 44
Seri, Yasuhiro Tokyo, JP 2 3

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