Chemical vapor deposition functionalization

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United States of America Patent

PATENT NO 9975143
SERIAL NO

14784731

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Abstract

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Chemical vapor deposition articles and processes include a chemical vapor deposition functionalization on a material, the material including an sp3 arrangement of carbon. The chemical vapor deposition functionalization is positioned to be contacted by a process fluid, a hydrocarbon, an analyte, exhaust, or a combination thereof. Additionally or alternatively, the chemical vapor deposition functionalization is not of a refrigerator shelf or a windshield.

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Patent Owner(s)

Patent OwnerAddress
SILCOTEK CORP112 BENNER CIRCLE BELLEFONTE PA 16823

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Silvis, Paul H Port Matilda, US 23 235
Smith, David A Bellefonte, US 251 5391

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