Process for controlling the period of a nanostructured block copolymer film based on styrene and on methyl methacrylate, and nanostructured block copolymer film

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United States of America Patent

PATENT NO 9976053
SERIAL NO

15317803

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Abstract

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The invention relates to a block copolymer film nanostructured into nanodomains, obtained from a base block copolymer having a molecular weight of greater than 50 kg/mol, and preferably greater than 100 kg/mol and less than 250 kg/mol, and at least one block of which comprises styrene, and at least one other block of which comprises methyl methacrylate. This film is characterized in that the styrene-based block is formed by a copolymer of styrene and diphenylethylene (DPE).

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Patent Owner(s)

Patent OwnerAddress
ARKEMA FRANCE420 RUE D'ESTIENNE D'ORVES COLOMBES 92700

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Chevalier, Xavier Grenoble, FR 43 93
Navarro, Christophe Bayonne, FR 72 263
Nicolet, Celia Talence, FR 27 45

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