Apparatus and method for treating substrate

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United States of America Patent

PATENT NO 9978584
SERIAL NO

15251760

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Abstract

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A method for treating a substrate, in which a supercritical fluid is supplied into a chamber, in which the substrate is carried, to treat the substrate, the method including a supply step of supplying the supercritical fluid into the chamber until a pressure of the interior of the chamber reaches a preset pressure, and a substrate treating step of performing a supercritical process while repeating supply and exhaust of the supercritical fluid into and out of the interior of the chamber after the supply step, wherein a flow rate of the supercritical fluid supplied into the chamber in the supply step is variable.

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Patent Owner(s)

Patent OwnerAddress
SEMES CO LTDCHUNGNAM SOUTH KOREA JEOLLANAM-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Cho, Min Jun Chungcheongnam-do, KR 5 6
Lee, Jae Myoung Chungcheongnam-do, KR 37 356
Lee, Young Hun Chungcheongnam-do, KR 56 86
Lim, Eui Sang Busan, KR 17 15

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