Garment pattern engineering utilizing two-dimensional imagary of the human form
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United States of America Patent
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May 29, 2018
Issued Date -
N/A
app pub date -
May 31, 2016
filing date -
May 31, 2016
priority date (Note) -
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status (Latency Note)
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Abstract
Embodiments of the present invention provide a method, system and computer program product for computer assisted pattern drafting in garment development. In an embodiment of the invention, a pattern making method includes initially acquiring a multiplicity of different two-dimensional image slices of a human form. Thereafter, a panel of a portion of a pattern of a garment is selected for processing in a data processing system and a metric computational rule for the selected panel is mapped to one of the two-dimensional image slices. A measurement of the one of the two-dimensional image slices is then acquired and the mapped metric computational rule is applied using the acquired measurement to produce a measurement for the selected panel.
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Family
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Cited Art Landscape
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