Photocurable composition and method of manufacturing film using the composition

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United States of America Patent

PATENT NO 9982102
SERIAL NO

14405929

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Abstract

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Provided are a photocurable composition having high filling property and capable of reducing a mold release force upon production of a film through the utilization of a photo-imprint method, and a method of manufacturing a film using the photocurable composition. The photocurable composition is a photocurable composition, including at least the following component (A) to component (C): (A) a polymerizable compound; (B) a photopolymerization initiator; and (C) a surfactant represented by the following general formula (1):

description='In-line Formulae' end='lead'Rf1-Rc-X.  (1)description='In-line Formulae' end='tail'

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Patent Owner(s)

Patent OwnerAddress
CANON KABUSHIKI KAISHAOHTA-KU TOKYO 146-8501

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Ito, Toshiki Kawasaki, JP 132 711
Kawasaki, Youji Utsunomiya, JP 24 168
Mihara, Chieko Isehara, JP 57 561

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