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• 15 United States
• 10 France
• 8 Japan
• 7 China
• 5 Korea
• 2 Other

Patent Owner(s)

Patent Owner	Address
SHIN-ETSU CHEMICAL CO LTD	TOKYO

International Classification(s)

• H01L:SEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICE....
• C08G:MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN B....
• C09D:COATING COMPOSITIONS, e.g. PAINTS, VARNISHES, LACQ....
• G03F:PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNE....

• [Classification Symbol]

• [Patents Count]

Inventor(s)

Inventor Name	Address	# of filed Patents	Total Citations
Hatakeyama, Jun	Jyoetsu, JP	692	7607
Kori, Daisuke	Jyoetsu, JP	142	782

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Maintenance Fees

Fee	Large entity fee	small entity fee	micro entity fee	due date
7.5 Year Payment	$3600.00	$1800.00	$900.00	Nov 29, 2025
11.5 Year Payment	$7400.00	$3700.00	$1850.00	Nov 29, 2029

Fee	Large entity fee	small entity fee	micro entity fee
Surcharge - 7.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge - 11.5 year - Late payment within 6 months	$160.00	$80.00	$40.00
Surcharge after expiration - Late payment is unavoidable	$700.00	$350.00	$175.00
Surcharge after expiration - Late payment is unintentional	$1,640.00	$820.00	$410.00

DATE PUBLISHED	PUBLICATION/PATENT NO.	PUBLICATION TYPE
May 29, 2018	US,9984878,B2   US9984878B2	GRANTED PATENT AS SECOND PUBLICATION
November 24, 2016	US,20160342088,A1   US20160342088A1	FIRST PUBLISHED PATENT APPLICATION

Full Text

US Patent No: 9984878

Resist under layer film composition and patterning process

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