Method and apparatus for generating radiation

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United States of America Patent

PATENT NO 9986628
SERIAL NO

14440934

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Abstract

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A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.

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Patent Owner(s)

  • ASML NETHERLANDS B.V.

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Banine, Vadim Yevgenyevich Deurne, NL 222 2884
Loopstra, Erik Roelof Eindhoven, NL 325 13295
Nikipelov, Andrey Eindhoven, NL 26 35
Osorio, Oliveros Edgar Alberto Eindhoven, NL 5 21
Struycken, Alexander Matthijs Eindhoven, NL 16 266
Van, Drieënhuizen Bert Pieter Veldhoven, NL 4 9
Van, Schoot Jan Bernard Plechelmus Eindhoven, NL 49 453
Yakunin, Andrei Mikhailovich Mierlo, NL 46 336

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