Rough MEMS surface

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United States of America Patent

PATENT NO 9988260
APP PUB NO 20170313573A1
SERIAL NO

15142381

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Abstract

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A surface of a cavity of a MEMS device that is rough to reduce stiction. In some embodiments, the average roughness (Ra) of the surface is 5 nm or greater. In some embodiments, the rough surface is formed by forming one or more layers of a rough oxidizable material, then oxidizing the material to form an oxide layer with a rough surface. Another layer is formed over the oxide layer with the rough surface, wherein the roughness of the oxide layer is transferred to the another layer.

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Patent Owner(s)

  • NXP USA, INC.

International Classification(s)

Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Montez, Ruben B Austin, US 21 100
Salian, Arvind S Austin, US 8 381
Steimle, Robert F Austin, US 39 643

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