Coating film-equipped glass substrate, and method for producing coating film-equipped glass substrate
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United States of America Patent
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Jun 5, 2018
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app pub date -
Oct 20, 2016
filing date -
Apr 24, 2014
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Abstract
A glass substrate provided with a coating film, including a glass substrate and a coating film containing at least one TiO2 layer having a refractive index of at least 2.20 at a wavelength of 632 nm, formed by low temperature plasma CVD method on the glass substrate, and a method for producing a glass substrate provided with a coating film, which includes forming a TiO2 layer on a glass substrate by low temperature plasma CVD method using a film-forming material containing at least one member selected from an alkoxide type titanium material, an amide type titanium material and a halide type titanium material, at a plasma power density of at least 55 kW/m at a film-forming rate of from 15 to 200 nm·m/min.
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