Hardmask composition and method of forming pattern using the hardmask composition

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United States of America Patent

PATENT NO 10331033
APP PUB NO 20160011511A1
SERIAL NO

14791912

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Abstract

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A hardmask composition includes a first material including one of an aromatic ring-containing monomer and a polymer containing a repeating unit including an aromatic ring-containing monomer, a second material including at least one of a hexagonal boron nitride and a precursor thereof, a chalcogenide-based material and a precursor thereof, and a two-dimensional carbon nanostructure and a precursor thereof, the two-dimensional carbon nanostructure containing about 0.01 atom % to about 40 atom % of oxygen, and a solvent.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTD129 SAMSUNG-RO YEONGTONG-GU SUWON-SI GYEONGGI-DO 16677 16677

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Kim, Sangwon Seoul, KR 411 2697
Park, Seongjun Seoul, KR 106 681
Shin, Hyeonjin Suwon-si, KR 190 806

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