Method of forming amorphous carbon monolayer and electronic device including amorphous carbon monolayer

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United States of America Patent

PATENT NO 9991017
APP PUB NO 20160111180A1
SERIAL NO

14714902

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Abstract

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A method of forming an amorphous carbon monolayer (ACM) and an electronic device including the ACM are provided. The method includes forming the ACM on a surface of a germanium (Ge) substrate via a chemical vapor deposition (CVD) process. The CVD process includes injecting a reaction gas including carbon-containing gas and hydrogen (H2) gas in to a reaction chamber containing the Ge substrate, wherein a partial pressure of the H2 gas in the reaction chamber may range from 1 Torr to 30 Torr.

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Patent Owner(s)

Patent OwnerAddress
SAMSUNG ELECTRONICS CO LTDGYEONGGI DO SOUTH KOREA GYEONGGI-DO

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Inventor(s)

Inventor Name Address # of filed Patents Total Citations
Hwang, Sungwoo Seoul, KR 58 426
Joo, Wonjae Seongnam-si, KR 34 89
Kim, Unjeong Osan-si, KR 28 97

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